An inverse problem arising in photolithography
Department of Mathematics Colloquium
Meeting Details
For more information about this meeting, contact Stephen G. Simpson.
Speaker: Fadil Santosa, IMA, University of Minnesota
Abstract Link: http://www.math.umn.edu/~santosa/
Abstract: Photolithography is a key process in the manufacturing of chips. In this presentation, we will start with an introduction to the subwavelength projection photolithography. The basic problem is that of optimal design. It involves creating masks through which light is projected to produce a desired intensity pattern. I will describe a formulation of this problem and its numerical implementation. We will also present a mathematical result as well as numerical examples.
Room Reservation Information
Room Number: 114 McAllister
Date: 04/29/2010
Time: 4:00pm - 5:00pm